<?xml version='1.0' encoding='UTF-8'?><metadata xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns="http://dublincore.org/documents/dcmi-terms/"><dcterms:title>Uniaxial strain-induced electronic property alterations of MoS2 monolayer</dcterms:title><dcterms:identifier>https://doi.org/10.34820/FK2/WR6MAO</dcterms:identifier><dcterms:creator>PURI HANDAYANI., ISMUDIATI</dcterms:creator><dcterms:publisher>Telkom University Dataverse</dcterms:publisher><dcterms:issued>2022-03-17</dcterms:issued><dcterms:modified>2022-03-17T05:07:49Z</dcterms:modified><dcterms:description>The MoS2 has attached interest due to its strained tuned
electronic and optical properties which open promising application in
strain engineering devices. In this study, we investigate the uniaxial strain
effect on the electronic properties of MoS2 monolayer by first-principles
calculations. Our calculation shows the crossover of the K ― K direct to 
―K indirect transition occurs at a strain of 1.743%. In addition, we also
observed a strong correlation between bandgap modification and the
density of states (DOS) of Mo-4𝑑 and S-3𝑝 at valence band maximum and
conduction band minimum. We propose that the interatomic distance
modified by the uniaxial strain along 𝑎-axis does not only create different
rates of bandgap alteration but also affects the Mo-4𝑑 DOS and possible
electronic transitions. This study points to the mechanism behind the
electronic structure modification of two-dimensional MoS2 monolayer,
which might have important implication on intervalley transitions.</dcterms:description><dcterms:subject>Physics</dcterms:subject><dcterms:contributor>PURI HANDAYANI, ISMUDIATI</dcterms:contributor><dcterms:dateSubmitted>2022-03-17</dcterms:dateSubmitted><dcterms:license>CC0</dcterms:license><dcterms:rights>CC0 Waiver</dcterms:rights></metadata>